DocumentCode
750462
Title
Layer selective disordering by photoabsorption-induced thermal diffusion in InGaAs/InP based multiquantum well structures
Author
Marsh, John H. ; De La Rue, Richard M. ; Bryce, A.C. ; Garrett, B. ; Glew, R.W.
Volume
28
Issue
12
fYear
1992
fDate
6/4/1992 12:00:00 AM
Firstpage
1117
Lastpage
1119
Abstract
Laser-induced intermixing of a buried InGaAs/InGaAsP multiquantum well structure using a CW Nd:YAG laser, operating at a wavelength of 1064 nm, has been demonstrated. The process does not involve transient melting of the semiconductor, but relies on preferential absorption by the active region producing sufficient heat to cause intermixing between the wells and barriers. Photoluminescence measurements at 77 K indicate that bandgap shifts as large as 123 meV are obtainable using moderate laser beam power densities and periods of irradiation.
Keywords
III-V semiconductors; chemical interdiffusion; gallium arsenide; indium compounds; laser beam effects; luminescence of inorganic solids; photoluminescence; semiconductor quantum wells; thermal diffusion; 1064 nm; 77 K; CW YAG:Nd laser; InGaAs-InGaAsP-InP; YAG:Nd; YAl5O12:Nd; active region; bandgap shifts; buried MQW structure; layer selective disordering; multiquantum well structures; photoabsorption-induced thermal diffusion; photoluminescence measurement; preferential absorption; semiconductor;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19920705
Filename
141151
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