• DocumentCode
    750462
  • Title

    Layer selective disordering by photoabsorption-induced thermal diffusion in InGaAs/InP based multiquantum well structures

  • Author

    Marsh, John H. ; De La Rue, Richard M. ; Bryce, A.C. ; Garrett, B. ; Glew, R.W.

  • Volume
    28
  • Issue
    12
  • fYear
    1992
  • fDate
    6/4/1992 12:00:00 AM
  • Firstpage
    1117
  • Lastpage
    1119
  • Abstract
    Laser-induced intermixing of a buried InGaAs/InGaAsP multiquantum well structure using a CW Nd:YAG laser, operating at a wavelength of 1064 nm, has been demonstrated. The process does not involve transient melting of the semiconductor, but relies on preferential absorption by the active region producing sufficient heat to cause intermixing between the wells and barriers. Photoluminescence measurements at 77 K indicate that bandgap shifts as large as 123 meV are obtainable using moderate laser beam power densities and periods of irradiation.
  • Keywords
    III-V semiconductors; chemical interdiffusion; gallium arsenide; indium compounds; laser beam effects; luminescence of inorganic solids; photoluminescence; semiconductor quantum wells; thermal diffusion; 1064 nm; 77 K; CW YAG:Nd laser; InGaAs-InGaAsP-InP; YAG:Nd; YAl5O12:Nd; active region; bandgap shifts; buried MQW structure; layer selective disordering; multiquantum well structures; photoabsorption-induced thermal diffusion; photoluminescence measurement; preferential absorption; semiconductor;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19920705
  • Filename
    141151