• DocumentCode
    758038
  • Title

    Multiple negative-differential-resistance (NDR) of InGaP/GaAs heterostructure-emitter bipolar transistor (HEBT)

  • Author

    Liu, Wen-Chau ; Tsai, Jung-Hui ; Lour, Wen-Shiung ; Laih, Lih-Wen ; Thei, Kong- Beng ; Wu, Cheng-Zu

  • Author_Institution
    Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
  • Volume
    17
  • Issue
    3
  • fYear
    1996
  • fDate
    3/1/1996 12:00:00 AM
  • Firstpage
    130
  • Lastpage
    132
  • Abstract
    An interesting multiple S-shaped negative-differential-resistance (NDR) phenomenon is observed for an InGaP/GaAs heterostructure-emitter bipolar transistor (HEBT) under the inverted operation mode. This behavior results from a sequential avalanche multiplication and two-stage barrier lowering effect. The two-stage barrier lowering effect is assumed to be caused by the high valence-band-discontinuity (/spl Delta/E/sub v/) to conduction-band-discontinuity (/spl Delta/E/sub c/) ratio at InGaP/GaAs heterointerface which gives holes and electrons accumulation effect successively. Under normal operation mode, a typical common-emitter current gain of 60 is obtained at collector current density of 400 A/cm/sup 2/ for the studied HEBT without emitter-edge thinning structure. Consequently, the controlled switching and transistor performances provide a promise of the studied device for circuit applications.
  • Keywords
    III-V semiconductors; avalanche breakdown; carrier density; characteristics measurement; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; negative resistance devices; HEBT; InGaP-GaAs; S-shaped NDR phenomenon; carrier accumulation effect; collector current density; common-emitter current gain; conduction-band-discontinuity; controlled switching; heterostructure-emitter bipolar transistor; inverted operation mode; multiple negative-differential-resistance; sequential avalanche multiplication; two-stage barrier lowering effect; valence-band-discontinuity; Bipolar transistors; Charge carrier processes; Current density; Etching; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Sea surface; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.485190
  • Filename
    485190