DocumentCode
760934
Title
Micromotor fabrication
Author
Mehregany, Mehran ; Senturia, Stephen D. ; Lang, Jeffrey H. ; Nagarkar, Pradnya
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
Volume
39
Issue
9
fYear
1992
fDate
9/1/1992 12:00:00 AM
Firstpage
2060
Lastpage
2069
Abstract
Micromotor fabrication and related issues are discussed. The micromotors under study are of the variable-capacitance side-drive type with salient-pole and wobble (harmonic) designs. Polysilicon surface micromachining forms the basis of the micromotor fabrication process. In this process, LPCVD heavily phosphorus-doped polysilicon is used for the structural parts, LPCVD silicon nitride is used for electrical isolation, and CVD low-temperature oxide is used to as the sacrificial material. The fabrication process affects the performance characteristics of the micromotor through the reproduction accuracy of the design geometry and through the modification of the characteristics of contacting surfaces. Pattern definition and delineation are among the most critical steps of the micromotor fabrication process because of the increasing surface topography during fabrication and the large film thicknesses utilized. The release and testing process can affect the frictional characteristics of the micromotor significantly, determining success or failure of operation by dielectric excitation
Keywords
micromechanical devices; semiconductor technology; small electric machines; CVD low-temperature oxide; LPCVD heavily P doped polysilicon; Si:P; Si3N4; SiO2; delineation; dielectric excitation; electrical isolation; fabrication process; harmonic designs; micromotor; pattern definition; performance characteristics; salient-pole; side-drive type; variable-capacitance; wobble designs; Capacitance; Conducting materials; Fabrication; Mechanical systems; Micromachining; Micromotors; Rotors; Silicon; Surface topography; Torque;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.155878
Filename
155878
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