DocumentCode
762442
Title
Decomposition of gaseous organic contaminants by surface discharge induced plasma chemical processing-SPCP
Author
Oda, Tetsuji ; Yamashita, Ryuichi ; Haga, Ichiro ; Takahashi, Tadashi ; Masuda, Senichi
Author_Institution
Dept. of Electr. Eng., Tokyo Univ., Japan
Volume
32
Issue
1
fYear
1996
Firstpage
118
Lastpage
124
Abstract
The decomposition performance of the surface induced plasma chemical processing (SPCP) for chlorofluorocarbon (83 ppm CFC-113 in air), acetone, trichloroethylene, and isopropylalcohol was experimentally examined. In every case, very high decomposition performance, more than 90 or 99% removal rate, is realized when the residence time is about 1 second and the input electric power for a 16 cm3 reactor is about 10 W. Acetone is the most stable compound and alcohol is most easily decomposed. The decomposed product-analysis by a gaschromato-massspectrometer has just started but very poor results are obtained. In fact, some portion of the isopropylalcohol may change to acetone which is worse than alcohol. The necessary energy to decompose one mol gas diluted in the air is calculated from the experiments. The necessary energy level for acetone and trichloroethylene is about one-tenth or one-fiftieth of that for chlorofluorocarbon
Keywords
chromatography; mass spectroscopy; organic compounds; plasma applications; surface discharges; waste disposal; CFC-113; acetone; chlorofluorocarbon; decomposed product-analysis; energy level; gaschromato-massspectrometer; gaseous organic contaminants decomposition; input electric power; isopropylalcohol; residence time; surface discharge induced plasma chemical processing; trichloroethylene; Atmospheric-pressure plasmas; Chemical processes; Humans; Inductors; Organic chemicals; Plasma chemistry; Plasma materials processing; Surface contamination; Surface discharges; Testing;
fLanguage
English
Journal_Title
Industry Applications, IEEE Transactions on
Publisher
ieee
ISSN
0093-9994
Type
jour
DOI
10.1109/28.485822
Filename
485822
Link To Document