• DocumentCode
    764350
  • Title

    Investigation on RF styrene plasma by emission spectroscopy

  • Author

    Chen, Meng ; Yang, Tsin-chi ; Ma, Zhenguo

  • Author_Institution
    Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
  • Volume
    23
  • Issue
    2
  • fYear
    1995
  • fDate
    4/1/1995 12:00:00 AM
  • Firstpage
    151
  • Lastpage
    155
  • Abstract
    In order to gain an insight into the processes in an RF styrene plasma, gas phase plasmas were investigated by emission spectroscopy. The plasma reactor was a bell-jar-type chamber with two parallel plate electrodes. The measurement of plasma emission spectra was made with axial resolution. The correlations among the emission intensities of CH and C4H2+ species, the polymer deposition rate and the polymeric structure of the deposited films were studied. The proposed analysis showed that the gas flow pattern in the plasma reactor, and the difference in collisions between styrene monomer molecules and energetic free electrons occurring in the plasma region and RF sheath, made the fragments and ions produced change in the different regions, resulting in a change in polymeric structure and deposition rate of the polymer films. With increasing distance between the substrate position and the lower electrode, the deposition rate and the concentration of phenyl groups both at the polymer surface and in the bulk decreased
  • Keywords
    high-frequency discharges; plasma CVD; plasma collision processes; plasma diagnostics; plasma sheaths; polymer films; polymers; visible spectra; RF sheath; RF styrene plasma; bell-jar-type chamber; deposited films; emission spectra; emission spectroscopy; energetic free electrons; gas phase plasmas; phenyl groups; plasma emission spectra; plasma reactor; polymer deposition rate; polymer films; styrene monomer molecules; Electrodes; Electrons; Fluid flow; Inductors; Pattern analysis; Plasma measurements; Plasma sheaths; Polymer films; Radio frequency; Spectroscopy;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.376580
  • Filename
    376580