• DocumentCode
    765759
  • Title

    Film Structures and Perpendicular Magnetic Anisotropy of RE-Fe Sputtered Films

  • Author

    Nawate, M. ; Kobe, H. ; Ohkoshi, M. ; Honda, S. ; Kusuda, T.

  • Author_Institution
    Faculty of Engng., Hiroshima Univ., Higashi-Hiroshima
  • Volume
    1
  • Issue
    6
  • fYear
    1985
  • Firstpage
    688
  • Lastpage
    690
  • Abstract
    The relation of film structure to magnetic anisotropy of GdFe films, sputtered with different bias voltages VB, are reported. Films were sputtered under an Ar pressure of 10 mTorr at various bias voltages VB. Film structures for different VB were determined using X-ray diffraction and SEM observations. Changes in film properties after annealing in air indicated that films formed with a high bias voltage are not easily oxidized. While structural changes occurred upon 300°C annealing of films formed with a low VB, no such changes were observed for films sputtered with a high VB.
  • Keywords
    Amorphous materials; Annealing; Argon; Crystallization; Heat treatment; Magnetic anisotropy; Magnetic films; Oxidation; Perpendicular magnetic anisotropy; Surface treatment;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4548913
  • Filename
    4548913
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=765759