• DocumentCode
    766736
  • Title

    Depositions of Co-Cr Films by EP magnetron Sputtering Technique

  • Author

    Yoshida, J. ; Takahashi, T. ; Miyata, T. ; Fukuda, Junichi ; Kindai, T. ; Koshisaka, N.

  • Author_Institution
    Toyama Univ., Faculty of Technology, Toyama.
  • Volume
    1
  • Issue
    7
  • fYear
    1985
  • Firstpage
    894
  • Lastpage
    896
  • Abstract
    Fast Co-Cr film deposition speed was obtained using the exposed pole (EP) magnetron sputtering technique. At an Ar gas pressure of 0.2 Pa and an applied power density of 7.6 W/cm2, a maximum film deposition speed of 0.18 ¿m/min was obtained. It was found that the film thickness and Co content both decrease monotonically from the center of the substrate outwards. Film thickness and Co content were found to be optimal under low Ar gas pressure and low magnetic field induced by the solenoid coil (Bs).
  • Keywords
    Argon; Chromium; Coils; Magnetic fields; Magnetic films; Perpendicular magnetic recording; Solenoids; Sputtering; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4549006
  • Filename
    4549006
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=766736