DocumentCode
767634
Title
A Bubble Generation Mechanism for Ion-Implanted Bubble Devices
Author
Urai, H.
Author_Institution
Microelectronics Research Labs., NEC Corporation.
Volume
1
Issue
9
fYear
1985
Firstpage
1114
Lastpage
1116
Abstract
A new mechanism of bubble generation in ion-implanted bubble devices has been proposed based on minimum generation current characteristies. This model shows that bubble nucleation requires a 180° magnetic wall shift in the transition layer between the ion-implanted and bubble layers which can be used to logically explain bubble generation in ion-implanted devices.
Keywords
Anisotropic magnetoresistance; Character generation; Circuits; Conductive films; Magnetic fields; Magnetization; Microelectronics; National electric code; Pulse generation; Space vector pulse width modulation;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1985.4549090
Filename
4549090
Link To Document