• DocumentCode
    772796
  • Title

    Degradation of floating-gate memory reliability by few electron phenomena

  • Author

    Molas, Gabriel ; Deleruyelle, Damien ; De Salvo, Barbara ; Ghibaudo, Gérard ; Gély, Marc ; Perniola, Luca ; Lafond, Dominique ; Deleonibus, Simon

  • Author_Institution
    CEA-Lab. of Electron., Technol., & Instrum., Grenoble
  • Volume
    53
  • Issue
    10
  • fYear
    2006
  • Firstpage
    2610
  • Lastpage
    2619
  • Abstract
    The purpose of this paper is to give a quantitative evaluation of the intrinsic reliability limits of floating-gate (FG) memories in the decananometer range due to the reduction of collective phenomena and to the dominance of single-electron stochastic behaviors. To this end, first, a model that quantitatively predicts the intrinsic dispersions of the memory retention time and programming window is proposed. Second, experimental results obtained on ultrascaled memory devices (with an active area as small as 30 nm times 30 nm) with either a continuous poly-Si FG or silicon nanocrystals will be shown and used to validate this model. Finally, extrapolations on the intrinsic reliability limits of future generations of Flash memories will be done
  • Keywords
    electron beam lithography; flash memories; silicon-on-insulator; single electron devices; 30 nm; collective phenomena reduction; electron phenomena; electron-beam lithography; flash memories; floating-gate memories; floating-gate memory reliability; intrinsic reliability limits; memory retention time; polysilicon nanocrystals; programming window; quantitative evaluation; quantum dots; silicon-on-insulator technology; single-electron stochastic behaviors; ultrascaled memory devices; Analytical models; Degradation; Electrons; Flash memory; Instruments; Nanocrystals; Nonvolatile memory; Predictive models; Silicon on insulator technology; Stochastic processes; Electron-beam (e-beam) lithography; memories; quantum dots; silicon-on-insulator (SOI) technology;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2006.882284
  • Filename
    1705117