A technique for producing ordered arrays of metallic nanoclusters by electroless deposition in focused ion beam patterns

Author

Weller, Robert A. ; Ryle, Wesley T. ; Newton, Allen T. ; McMahon, Matthew D. ; Miller, Timothy M. ; Magruder, Robert H., III

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA

Volume

2

Issue

3

fYear

2003

Firstpage

154

Lastpage

157

Abstract

Ordered arrays of Au nanoclusters have been prepared on Si substrates using a combination of focused ion beam (FIB) surface processing and electroless deposition. Particles varying in size from approximately 30 to 100 nm have been produced in regular grid patterns whose geometry is controlled to high precision by the FIB. Potential applications range from engineering of the surface plasmon resonance for numerous optical applications to building structures for tethering organic molecules in specific geometric arrangements.

Keywords

arrays; atomic force microscopy; electroless deposition; focused ion beam technology; gold; nanostructured materials; nanotechnology; optical materials; scanning electron microscopy; surface plasmon resonance; 30 to 100 nm; AFM image; Au; Au nanoclusters; SEM image; Si; Si substrates; electroless deposition; focused ion beam patterns; focused ion beam surface processing; geometric arrangements; metallic nanoclusters; optical applications; ordered arrays; organic molecule tethering; particle size; regular grid patterns; surface plasmon resonance engineering; Biomedical optical imaging; Geometrical optics; Ion beams; Nanocrystals; Optical surface waves; Particle beam optics; Physics; Plasmons; Resonance; Size control;

fLanguage

English

Journal_Title

Nanotechnology, IEEE Transactions on

Publisher

ieee

ISSN

1536-125X

Type

jour

DOI

10.1109/TNANO.2003.817528

Filename

1230116