• DocumentCode
    780634
  • Title

    AlGaN/GaN Recessed MIS-Gate HFET With High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications

  • Author

    Oka, Tohru ; Nozawa, Tomohiro

  • Author_Institution
    Adv. Technol. Res. Labs., Sharp Corp., Nara
  • Volume
    29
  • Issue
    7
  • fYear
    2008
  • fDate
    7/1/2008 12:00:00 AM
  • Firstpage
    668
  • Lastpage
    670
  • Abstract
    This letter reports normally-off operation of an AlGaN/GaN recessed MIS-gate heterostructure field-effect transistor with a high threshold voltage. The GaN-based recessed MIS-gate structure in conjunction with negative polarization charges under the gate allows us to achieve the high threshold voltage, whereas the low on-state resistance is maintained by the 2-D electron gas remaining in the channel except for the recessed MIS-gate region. The fabricated device exhibits a threshold voltage as high as 5.2 V with a maximum field-effect mobility of 120 cm2/Vmiddots, a maximum drain current of over 200 mA/mm, and a breakdown voltage of 400 V.
  • Keywords
    III-V semiconductors; MISFET; aluminium compounds; gallium compounds; wide band gap semiconductors; 2-D electron gas; AlGaN-GaN; MIS-gate HFET; breakdown voltage; heterostructure field-effect transistor; high-threshold-voltage; maximum drain current; maximum field-effect mobility; negative polarization charges; Aluminum gallium nitride; Gallium nitride; HEMTs; MISFETs; MODFETs; Plasma applications; Plasma chemistry; Polarization; Power electronics; Threshold voltage; GaN; MIS; heterostructure field-effect transistor (HFET); normally-off; threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2008.2000607
  • Filename
    4558082