• DocumentCode
    783744
  • Title

    Proton-beam writing of poly-methylmethacrylate buried channel waveguides

  • Author

    Sum, T.C. ; Bettiol, A.A. ; Florea, Catalin ; Watt, F.

  • Author_Institution
    Sch. of Phys. & Math. Sci., Nanyang Technol. Univ., Singapore
  • Volume
    24
  • Issue
    10
  • fYear
    2006
  • Firstpage
    3803
  • Lastpage
    3809
  • Abstract
    In this paper, the authors report on the fabrication and characterization of poly-methylmethacrylate (PMMA) buried channel waveguides. The waveguides were fabricated using an emerging lithographic technique known as proton-beam writing. Depending on the proton fluence used, two different waveguide-formation mechanisms are possible. Single-mode waveguides with the light confinement occurring at the end of range were fabricated using fluences <75 nC/mm2. The refractive-index profiles of these single-mode waveguides were recovered using the propagation mode near-field method. For fluences >100 nC/mm2, multimode waveguides may also be fabricated with the light confinement occurring beneath the end of range. The compaction of the PMMA surface after proton irradiation was investigated using an atomic force microscope. The propagation losses of these PMMA waveguides were also determined
  • Keywords
    atomic force microscopy; optical fabrication; optical losses; optical polymers; optical waveguides; photolithography; proton beams; proton effects; refractive index; atomic force microscope; buried channel waveguides; lithography; multimode waveguides; poly-methylmethacrylate; propagation mode near-field method; proton fluence; proton-beam writing; refractive-index profiles; Ion implantation; Optical device fabrication; Optical materials; Optical polymers; Optical refraction; Optical waveguides; Particle beam optics; Physics; Protons; Writing; Compaction; PMMA buried channel waveguides; direct write; near-field mode profiles; propagation mode near-field method; proton-beam writing; refractive-index profiles;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2006.881474
  • Filename
    1707846