• DocumentCode
    785842
  • Title

    Electron mobility in an AlGaN/GaN two-dimensional electron gas. I. Carrier concentration dependent mobility

  • Author

    Katz, Oded ; Horn, Adi ; Bahir, G. ; Salzman, Joseph

  • Author_Institution
    Dept. of Electr. Eng., Technion-Israel Inst. of Technol., Haifa, Israel
  • Volume
    50
  • Issue
    10
  • fYear
    2003
  • Firstpage
    2002
  • Lastpage
    2008
  • Abstract
    The transport properties of two-dimensional electron gas (2-DEG) at the AlGaN/GaN interface were studied by characterizing the 2-DEG mobility dependence on carrier concentration, ns, and temperature. High-quality AlGaN/GaN heterostructures were grown, and heterostructure field effect transistors (HFETs) using a Fat FET geometry were fabricated. Measurements of 2-DEG mobility were performed by magnetoresistance and capacitance-conductance. In order to understand the dominant transport factors, the mobility was modeled using different scattering mechanisms and compared to our results. It is found that mobility dependence on ns shows a bell-shape behavior over the whole temperature range. For low ns the mobility is dominated by Coulomb interaction from interface charge, and at high ns the mobility is dominated by interface roughness. Using previously reported experimental values of interface charge and interface roughness in our modeling, we show good agreement with mobility measurement results. Scattering from interface states in AlGaN/GaN heterostructures, seems to be related to the high polarization field in the heterointerface. At temperatures higher than 200K polar optical phonon scattering dominates the transport, yet both interface charge and roughness affect the mobility at the low and high ns, respectively.
  • Keywords
    III-V semiconductors; aluminium compounds; carrier density; electron mobility; gallium compounds; junction gate field effect transistors; magnetoresistance; semiconductor heterojunctions; two-dimensional electron gas; wide band gap semiconductors; AlGaN-GaN; AlGaN/GaN heterostructure; Coulomb interaction; FAT HFET; capacitance-conductance; carrier concentration; electron mobility; electronic transport; heterostructure field effect transistor; interface charge scattering; interface roughness scattering; interface states; magnetoresistance; polar optical phonon scattering; polarization field; temperature dependence; two-dimensional electron gas; Aluminum gallium nitride; Electron mobility; FETs; Gallium nitride; Geometry; HEMTs; MODFETs; Magnetic field measurement; Optical scattering; Temperature dependence;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.816103
  • Filename
    1232916