DocumentCode
786508
Title
Mode-field converting silica-based waveguide by local heat treatment
Author
Yanagisawa, M. ; Yamada, Y. ; Kobayashi, Masato
Author_Institution
NTT Opto-electronics Labs., Ibaraki, Japan
Volume
28
Issue
21
fYear
1992
Firstpage
1958
Lastpage
1959
Abstract
A mode-field converting silica-based waveguide was fabricated simply by locally heating the waveguide end. The mode-field diameter changes from 8.0 to 9.6 mu m with a taper length of 4 mm and then the fibre coupling loss decreased to less than 0.1 dB. This technique was successfully applied to a waveguide array.
Keywords
heat treatment; integrated optics; optical losses; optical waveguides; optical workshop techniques; silicon compounds; 0.1 dB; 8 to 9.6 micron; SiO 2 based optical waveguide; fibre coupling loss; local heat treatment; mode field conversion; mode-field diameter; silica-based waveguide; waveguide array;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19921255
Filename
170859
Link To Document