DocumentCode
786678
Title
Delayed-turn-on phenomenon in accumulation-type SOI pMOS device operating at liquid nitrogen temperature
Author
Kuo, J.B. ; Sim, J.H.
Author_Institution
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume
28
Issue
21
fYear
1992
Firstpage
1983
Lastpage
1984
Abstract
A unique delayed-turn-on phenomenon in an accumulation-type SOI pMOS device operating at 77 K based on the low-temperature PISCES simulation is reported. As compared with the 300 K case, in the delayed-turn-on region, the accumulation-type SOI pMOS device at 77 K may not provide a larger transconductance as a result of the carrier freezeout effects in the thin film.
Keywords
accumulation layers; cryogenics; metal-insulator-semiconductor devices; semiconductor-insulator boundaries; 77 K; Si-SiO 2; accumulation-type SOI pMOS device; carrier freezeout effects; delayed-turn-on phenomenon; drain current; low-temperature PISCES simulation; transconductance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19921271
Filename
170875
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