• DocumentCode
    788953
  • Title

    Modifying the nanostructure of Co[SiO2] samples by controlled annealing

  • Author

    Denardin, J.C. ; Knobel, M. ; Socolovsky, L.M. ; Brandl, A.L. ; Zhang, X.X.

  • Author_Institution
    Inst. de Fisica Gleb Wataghin, Univ. Estadual de Campinas, Brazil
  • Volume
    39
  • Issue
    5
  • fYear
    2003
  • Firstpage
    2767
  • Lastpage
    2769
  • Abstract
    In situ measurements of resistance were made on cosputtered Co0.35[SiO2]0.65 granular films during annealing. The aim is to control the thermal treatment parameters and map the microstructural changes of the samples, with the respective magnetotransport response. Results of transmission electron microscopy, dc magnetization, and temperature dependence of resistivity, after annealing, show a clear evolution in the nanostructure of the samples, with increasing average Co grain sizes and wider dispersion.
  • Keywords
    annealing; cobalt; demagnetisation; electrical resistivity; grain size; magnetic thin films; nanocomposites; particle reinforced composites; silicon compounds; sputtered coatings; transmission electron microscopy; Co-SiO2; TEM; annealing; cosputtered granular films; demagnetization; grain size; nanostructure; resistance; resistivity; temperature dependence; Annealing; Electrical resistance measurement; Furnaces; Magnetic films; Magnetic separation; Magnetization; Metal-insulator structures; Temperature dependence; Transmission electron microscopy; Tunneling magnetoresistance;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2003.815593
  • Filename
    1233211
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=788953