• DocumentCode
    803386
  • Title

    Electric field domains in p-Si/SiGe quantum cascade structures

  • Author

    Ikonic, Zoran ; Harrison, Paul ; Kelsall, Robert W.

  • Author_Institution
    Sch. of Electron. & Electr. Eng., Univ. of Leeds, UK
  • Volume
    53
  • Issue
    2
  • fYear
    2006
  • Firstpage
    189
  • Lastpage
    195
  • Abstract
    The formation of domains in quantum cascade structures is one of the mechanisms strongly affecting the operation of quantum cascade lasers, quantum-well infrared detectors, and other devices. In this paper, we consider the problem of domain formation in p-doped Si/SiGe quantum cascades, using a carrier scattering transport framework. In effect, the hole flow along the cascade is described via scattering between quantized states belonging to neighboring periods, caused by phonons, alloy disorder, and carrier-carrier interactions. The generation of either periodic or of nonperiodic domains is studied in uniformly doped cascades, as well as the influence of modulation doping of cascades on the domain formation.
  • Keywords
    Ge-Si alloys; electrical conductivity; elemental semiconductors; hole mobility; interface phonons; interface states; semiconductor doping; semiconductor materials; semiconductor quantum wells; silicon; Si-SiGe; carrier scattering transport; electric field domain formation; hole flow; modulation doping; p-doped quantum cascades; quantum cascade structures; semiconductor doping; Acoustic scattering; Germanium silicon alloys; Light scattering; Optical scattering; Particle scattering; Quantum cascade lasers; Quantum well lasers; Resonance light scattering; Resonant tunneling devices; Silicon germanium; Domain formation; SiGe; quantum cascade structures;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2005.862498
  • Filename
    1580853