DocumentCode
803591
Title
Transient Ionizing Radiation Effects in MOS/LSI
Author
Raymond, J.P. ; Pocock, D.N.
Author_Institution
Northrop Corporate Laboratories Hawthorne, California 90250
Volume
18
Issue
6
fYear
1971
Firstpage
288
Lastpage
294
Abstract
Transient ionizing radiation effects data on six types of MOS/LSI devices are presented considering variations in the pulse width of the radiation environment and circuit design of the MOS/ LSI cell. Four of the device types employed dynamic logic cells and the other two were formed with static logic cells. Transient failure levels of the dynamic arrays occurred with exposure to a total radiation dose of 1-10 rads(Si) through a time as long as 5 ms. The static logic arrays demonstrated significant transient responses at radiation levels of 108 rads(Si)/s, or transient failure of stored information with exposure to a total radiation dose of 10-50 rads(Si).
Keywords
Ionizing radiation; Large scale integration; Logic arrays; Logic devices; MOSFETs; Photoconductivity; Shift registers; Space vector pulse width modulation; Threshold voltage; Transient response;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1971.4326445
Filename
4326445
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