• DocumentCode
    803591
  • Title

    Transient Ionizing Radiation Effects in MOS/LSI

  • Author

    Raymond, J.P. ; Pocock, D.N.

  • Author_Institution
    Northrop Corporate Laboratories Hawthorne, California 90250
  • Volume
    18
  • Issue
    6
  • fYear
    1971
  • Firstpage
    288
  • Lastpage
    294
  • Abstract
    Transient ionizing radiation effects data on six types of MOS/LSI devices are presented considering variations in the pulse width of the radiation environment and circuit design of the MOS/ LSI cell. Four of the device types employed dynamic logic cells and the other two were formed with static logic cells. Transient failure levels of the dynamic arrays occurred with exposure to a total radiation dose of 1-10 rads(Si) through a time as long as 5 ms. The static logic arrays demonstrated significant transient responses at radiation levels of 108 rads(Si)/s, or transient failure of stored information with exposure to a total radiation dose of 10-50 rads(Si).
  • Keywords
    Ionizing radiation; Large scale integration; Logic arrays; Logic devices; MOSFETs; Photoconductivity; Shift registers; Space vector pulse width modulation; Threshold voltage; Transient response;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1971.4326445
  • Filename
    4326445