• DocumentCode
    811796
  • Title

    Carrier Mobility/Transport in Undoped-UTB DG FinFETs

  • Author

    Chowdhury, Murshed M. ; Trivedi, Vishal P. ; Fossum, Jerry G. ; Mathew, Leo

  • Author_Institution
    Freescale Semicond., Austin, TX
  • Volume
    54
  • Issue
    5
  • fYear
    2007
  • fDate
    5/1/2007 12:00:00 AM
  • Firstpage
    1125
  • Lastpage
    1131
  • Abstract
    A process/physics-based double-gate (DG) MOSFET model (UFDG), which includes a quantum-based carrier mobility model, is used to examine carrier transport in undoped ultrathin-silicon bodies/channels. The model predicts for {100}-surface devices, in accord with measurements, effective electron and hole mobilities that are dramatically higher than those in contemporary bulk-Si MOSFETs at the same integrated inversion-carrier density. Calibration of UFDG to undoped p- and n-channel DG FinFETs yields consistent results, showing very high mobilities in contemporary FinFETs, implying relatively smooth {110} fin-sidewall surfaces, and giving new insights on electron and hole mobilities in DG MOSFETs with {110} versus {100} surfaces. The calibrated model is used to simulate 17.5-nm DG FinFETs with midgap gates, predicting ballistic-like currents and, hence, suggesting that strained-Si channels are not needed for mobility enhancement in these nonclassical devices
  • Keywords
    MOSFET; electron mobility; hole mobility; silicon; surface roughness; 17.5 nm; ballistic-limit current; bulk-silicon MOSFET; carrier mobility; carrier transport; double-gate MOSFET model; hole mobilities; surface roughness; ultrathin body; undoped ultrathin-silicon channels; undoped-UTB DG FinFET; Calibration; Charge carrier processes; Effective mass; Eigenvalues and eigenfunctions; Electron mobility; FinFETs; MOSFET circuits; Predictive models; Rough surfaces; Surface roughness; Ballistic-limit current; double-gate (DG) FinFET; mobility; nonclassical devices; surface roughness; ultrathin body;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.893669
  • Filename
    4160095