Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher

Author

Rashap, Brian A. ; Elta, Michael E. ; Etemad, Hossein ; Fournier, Jeffrey P. ; Freudenberg, James S. ; Giles, Martin D. ; Grizzle, Jessy W. ; Kabamba, Pierre T. ; Khargonekar, Pramod P. ; Lafortune, StCphane ; Moyne, James R. ; Teneketzis, Demosthenis ; T

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA

Volume

8

Issue

3

fYear

1995

fDate

8/1/1995 12:00:00 AM

Firstpage

286

Lastpage

297

Abstract

This paper describes the development of real-time control technology for the improvement of manufacturing characteristics of reactive ion etchers. A general control strategy is presented. The principal ideas are to sense key plasma parameters, develop a dynamic input-output model for the subsystem connecting the equipment inputs to the key plasma variables, and design and implement a multivariable control system to control these variables. Experimental results show that this approach to closed-loop control leads to a much more stable etch rate in the presence of a variety of disturbances as compared to current industrial practice

Keywords

closed loop systems; multivariable control systems; process control; real-time systems; semiconductor device manufacture; sputter etching; closed-loop control; control strategy; dynamic input-output model; manufacturing characteristics; multivariable control system; plasma parameters; reactive ion etcher; real-time feedback control; semiconductor manufacturing equipment; Control system synthesis; Electrical equipment industry; Etching; Joining processes; Plasma applications; Plasma materials processing; Plasma properties; Plasma stability; Pulp manufacturing; Semiconductor device manufacture;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.401003

Filename

401003