• DocumentCode
    820635
  • Title

    Hole Transport in MOS Oxides

  • Author

    Hughes, R.C. ; EerNisse, E.P. ; Stein, H.J.

  • Author_Institution
    Sandia Laboratories, Albuquerque, New Mexico 87115
  • Volume
    22
  • Issue
    6
  • fYear
    1975
  • Firstpage
    2227
  • Lastpage
    2233
  • Keywords
    Charge carrier processes; Electron beams; Electron mobility; Electron traps; Ion implantation; Laboratories; Motion detection; Photoconductivity; Pulse generation; Temperature;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1975.4328110
  • Filename
    4328110