• DocumentCode
    826396
  • Title

    Explaining strain [in silicon]

  • Author

    Keyes, Robert W.

  • Author_Institution
    Div. of Res., IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    18
  • Issue
    5
  • fYear
    2002
  • fDate
    9/1/2002 12:00:00 AM
  • Firstpage
    36
  • Lastpage
    39
  • Abstract
    Large effects of elastic strain on the electrical resistance of silicon were discovered not long after the recognition of silicon as the material for the development of solid-state electronics. The effects were shortly employed as the basis of a variety of mechanical sensors. More recently, the use of strain to improve the performance of field-effect transistors (FETs) has drawn increased attention to its role as a part of the arsenal of silicon electronic technology. Attention to unwanted strain as a source of problems is also increasing. This article is aimed at explaining the basis of the effects of strain on the electrical properties of n-silicon and how these effects produce both good and bad results.
  • Keywords
    band structure; carrier mobility; electrical conductivity; elemental semiconductors; semiconductor thin films; silicon; strain sensors; FETs; elastic strain; electrical properties; electrical resistance; n-Si; solid-state electronics; Capacitive sensors; Circuits; Conductivity; Electrons; Force sensors; Lattices; Mechanical sensors; Silicon alloys; Strain measurement; Substrates;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/MCD.2002.1035350
  • Filename
    1035350