DocumentCode
826396
Title
Explaining strain [in silicon]
Author
Keyes, Robert W.
Author_Institution
Div. of Res., IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
18
Issue
5
fYear
2002
fDate
9/1/2002 12:00:00 AM
Firstpage
36
Lastpage
39
Abstract
Large effects of elastic strain on the electrical resistance of silicon were discovered not long after the recognition of silicon as the material for the development of solid-state electronics. The effects were shortly employed as the basis of a variety of mechanical sensors. More recently, the use of strain to improve the performance of field-effect transistors (FETs) has drawn increased attention to its role as a part of the arsenal of silicon electronic technology. Attention to unwanted strain as a source of problems is also increasing. This article is aimed at explaining the basis of the effects of strain on the electrical properties of n-silicon and how these effects produce both good and bad results.
Keywords
band structure; carrier mobility; electrical conductivity; elemental semiconductors; semiconductor thin films; silicon; strain sensors; FETs; elastic strain; electrical properties; electrical resistance; n-Si; solid-state electronics; Capacitive sensors; Circuits; Conductivity; Electrons; Force sensors; Lattices; Mechanical sensors; Silicon alloys; Strain measurement; Substrates;
fLanguage
English
Journal_Title
Circuits and Devices Magazine, IEEE
Publisher
ieee
ISSN
8755-3996
Type
jour
DOI
10.1109/MCD.2002.1035350
Filename
1035350
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