DocumentCode
829456
Title
Physical Mechanism of Interfacial Thermal Resistance in Electronic Packaging Based on a Mixed MD/FE Model
Author
Yang, Ping ; Liao, Ningbo
Author_Institution
Sch. of Mech. Eng., Jiangsu Univ., Zhenjiang
Volume
31
Issue
3
fYear
2008
Firstpage
496
Lastpage
501
Abstract
A multiscale model is constructed to study interfacial thermal resistance in electronic packaging. The model combines a molecular dynamics simulation for the critical regions within the system with a finite element (FE) method for a continuum description of the remainder of the system. For nonequilibrium simulations, the establishment of the proper boundary condition is very difficult. In this mixed model, the continuum subdomain serves primarily as a boundary model that provides the low frequency impedance and a sink for the energy associated with outgoing waves of the molecular dynamics model. The simulations results show that the temperature distribution is nonuniform along the interface. At primary stage, the interfacial thermal resistance is unstable and will become very large at certain time steps. At the last stage, the change of interfacial thermal resistance tends to be stable. There are few direct experimental measurements of the interfacial thermal resistance between dissimilar materials, while the similar experimental results support the conclusions in this paper.
Keywords
electronics packaging; finite element analysis; molecular dynamics method; temperature distribution; thermal resistance; electronic packaging; finite element method; interfacial thermal resistance; mixed MD/FE model; molecular dynamics simulation; temperature distribution; Boundary conditions; Electrical resistance measurement; Electronic packaging thermal management; Electronics packaging; Finite element methods; Frequency; Impedance; Iron; Temperature distribution; Thermal resistance; Electronic packaging; interfacial thermal resistance; mixed MD/FE model; physical mechanism;
fLanguage
English
Journal_Title
Advanced Packaging, IEEE Transactions on
Publisher
ieee
ISSN
1521-3323
Type
jour
DOI
10.1109/TADVP.2008.927830
Filename
4591500
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