• DocumentCode
    831188
  • Title

    High power InGaAs-GaAs-InGaP buried heterostructure strained quantum well lasers grown by two step MOVPE

  • Author

    Sin, Y.K. ; Horikawa, H. ; Kamijoh, T.

  • Author_Institution
    Oki Electr. Ind. Co. Ltd., Tokyo, Japan
  • Volume
    29
  • Issue
    2
  • fYear
    1993
  • Firstpage
    240
  • Lastpage
    242
  • Abstract
    Data are presented on device results from buried heterostructure InGaAs-GaAs strained quantum well lasers with In0.49Ga0.51P cladding layers ( lambda L=980 nm). AR-HR coated buried heterostructure lasers with a p-n InGaP current blocking junction show low laser thresholds of 3.1 mA and high output powers of 95 mW both measured CW at RT. This is the first demonstration of InGaAs-GaAs-InGaP buried heterostructure lasers entirely grown by a two step MOVPE process.
  • Keywords
    III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; semiconductor growth; semiconductor lasers; vapour phase epitaxial growth; 3.1 mA; 95 mW; 980 nm; In 0.49Ga 0.51P cladding layers; InGaAs-GaAs-InGaP; buried heterostructure strained quantum well lasers; current blocking junction; laser thresholds; output powers; two step MOVPE;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19930165
  • Filename
    184612