Synthesis and SAW characteristics of AlN thin films fabricated on Si and GaN using helicon sputtering system

Author

Chen, S.W. ; Lin, H.F. ; Sung, T.T. ; Wu, J.D. ; Kao, H.L. ; Chen, J.S.

Volume

39

Issue

23

fYear

2003

Abstract

High quality AlN films have been obtained on SiO₂/Si and GaN/Sapphire using the helicon sputtering method. Fabrication of the thin film layered structure surface acoustic wave (SAW) devices has been demonstrated and the promising characteristics are presented

Keywords

III-V semiconductors <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; X-ray diffraction <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; aluminium compounds <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; atomic force microscopy <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; frequency response <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; piezoelectric thin films <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; sputter deposition <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; sputtered coatings <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; surface acoustic wave filters <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; surface acoustic waves <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; surface structure <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; wide band gap semiconductors <AlN thin films fabricated, Si and GaN, helicon sputtering syst., synthesis and SAW characts.>; AlN; SAW characteristics; SAW filters; XRD patterns; atomic force microscopy; frequency response; helicon sputtering system; high quality films; highly textured surface; layered structure devices; piezoelectric films; sputtering synthesis; surface morphology; thin films;

fLanguage

English

Journal_Title

Electronics Letters

Publisher

iet

ISSN

0013-5194

Type

jour

DOI

10.1049/el:20031088

Filename

1248999