• DocumentCode
    834462
  • Title

    Parasitic Emission Suppression in Arrays of Individually Addressable Silicon Microcavity Plasma Devices

  • Author

    Tchertchian, P.A. ; Spinka, T.M. ; Park, S.-J. ; Eden, J.G.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL
  • Volume
    36
  • Issue
    4
  • fYear
    2008
  • Firstpage
    1254
  • Lastpage
    1255
  • Abstract
    Full addressability of arrays of Si microcavity plasma devices has been demonstrated by adopting a split top electrode design. Arrays of pyramidal microcavities with emitting apertures of 100 times 100 mum2, a pixel pitch of 200 mum, and sizes as large as 512 times 512 pixels have been fabricated in 250-mum-thick Si(100) wafers. Parasitic capacitance is responsible for weak emission from adjacent microcavities when a single pixel is addressed but the suppression of nearest neighbor fluorescence with the current array design is ~6 dB. Any pixel in the array can be addressed with an rms voltage as low as 240 V when the array is operating in 500 torr of Ne.
  • Keywords
    capacitance; electrodes; fluorescence; microcavities; plasma devices; silicon; Si; full addressability; nearest neighbor fluorescence suppression; parasitic capacitance; parasitic emission suppression; pressure 500 torr; pyramidal microcavities; silicon microcavity plasma devices; split top electrode design; voltage 240 V; weak emission; Apertures; Dielectric devices; Dielectric substrates; Electrodes; Fluorescence; Microcavities; Optical films; Plasma devices; Silicon; Testing; Arrays; microcavity; microplasma; silicon;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.926940
  • Filename
    4599115