DocumentCode
834483
Title
Pulsed Low Frequency Inductively Coupled Plasma Generator and Applications
Author
Teske, Christian James ; Jacoby, Joachim
Author_Institution
Inst. for Appl. Phys., Johann Wolfgang Goethe-Univ., Frankfurt
Volume
36
Issue
4
fYear
2008
Firstpage
1930
Lastpage
1936
Abstract
In this paper, an inductively coupled pulsed plasma source with an operating frequency of 29 kHz is described. Using a series resonance circuit with a load capacitance of 12 muF and large diameter (approximately 20 cm) induction coils surrounding a spherical discharge vessel, a discharge plasma was produced and investigated in a pressure range of 0.1 to 100 Pa. Pulsed coil currents reached a maximum value of 9.6 kA with current rise times of 1.8 kA/mus while achieving an energy coupling efficiency of 80% between the driving circuit and the plasma. Pulsed-power peak values reached more than 800 kW. Moreover, the spectroscopic diagnostic revealed a high fraction of ionized particles and an emission spectrum in the near UV domain. Electron densities reached peak values of 1021 m-3. By using a fast camera system, the initiation of the discharge was investigated. The ignition of the discharge along an azimuthal path was documented, showing evidence of an entirely inductive plasma initiation without capacitive coupling.
Keywords
capacitors; coils; discharges (electric); plasma applications; plasma density; plasma diagnostics; plasma sources; capacitance 12 muF; current 9.6 kA; discharge initiation; discharge plasma; energy coupling efficiency; fast camera system; frequency 29 kHz; inductively coupled pulsed plasma source; ionized particle fraction; large diameter induction coils; load capacitance; plasma UV emission spectrum; plasma electron density; pressure 0.1 Pa to 100 Pa; pulsed coil currents; pulsed low frequency inductively coupled plasma generator; series resonance circuit; spectroscopic diagnostic; spherical discharge vessel; Coils; Coupling circuits; Fault location; Frequency; Induction generators; Plasma applications; Plasma density; Plasma sources; Pulse generation; RLC circuits; Diagnostics; plasma dynamics; plasma sources;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2008.927377
Filename
4599117
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