The response of a microwave multipolar bucket plasma to a high voltage pulse

Author

Qin, Shu ; Chan, Chung ; McGruer, Nicol E. ; Browning, Jim ; Warner, Keith

Author_Institution

Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA

Volume

19

Issue

6

fYear

1991

fDate

12/1/1991 12:00:00 AM

Firstpage

1272

Lastpage

1278

Abstract

A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse is developed for plasma source ion implantation (PSII). The primary purpose is to develop a theoretical model of PSII plasma physics to be used in conjunction with a model of ion-target interaction to optimize PSII processing. Measurements of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models

Keywords

ion implantation; plasma applications; plasma collision processes; plasma diagnostics; plasma production; plasma sheaths; plasma simulation; plasma-wall interactions; 100 mtorr; collisional model; high voltage pulse; ion-target interaction; microwave multipolar bucket plasma; plasma source ion implantation; response; sheath position; sheath thickness; target current; Current measurement; Ion implantation; Physics; Plasma immersion ion implantation; Plasma materials processing; Plasma measurements; Plasma sheaths; Plasma sources; Predictive models; Voltage;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.125051

Filename

125051