DocumentCode
836949
Title
An Assessment of the Radiation Tolerance of Collector Diffusion Isolation Bipolar Technology
Author
Richards, R F ; Slater, S R ; Colaco, S F
Author_Institution
Ministry of Defence (PE), AWRE, Aldermaston, Berkshire
Volume
26
Issue
1
fYear
1979
Firstpage
952
Lastpage
958
Abstract
A systematic assessment has been made of the tolerance to various radiation effects for the CDI bipolar integrated circuit fabrication technology. The study is based on the performance of both individual devices and circuit building blocks covering a range of applications from SSI to VLSI. The technology has not previously been reported in the context of its radiation performance. A number of properties have been recognised which increase the tolerance of the CDI technology to radiation. Of advantage are the fully diffused collector region and the heavily diffused base surface layer. The identified attributes include inherent latchup resistance, a high degree of tolerance to cumulative ionisation dose and to neutron displacement damage, and a reasonable transient upset behaviour.
Keywords
Fabrication; Integrated circuit technology; Ionization; Isolation technology; Logic arrays; Photoconductivity; Semiconductor materials; Substrates; Surface resistance; Very large scale integration;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1979.4329751
Filename
4329751
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