• DocumentCode
    836949
  • Title

    An Assessment of the Radiation Tolerance of Collector Diffusion Isolation Bipolar Technology

  • Author

    Richards, R F ; Slater, S R ; Colaco, S F

  • Author_Institution
    Ministry of Defence (PE), AWRE, Aldermaston, Berkshire
  • Volume
    26
  • Issue
    1
  • fYear
    1979
  • Firstpage
    952
  • Lastpage
    958
  • Abstract
    A systematic assessment has been made of the tolerance to various radiation effects for the CDI bipolar integrated circuit fabrication technology. The study is based on the performance of both individual devices and circuit building blocks covering a range of applications from SSI to VLSI. The technology has not previously been reported in the context of its radiation performance. A number of properties have been recognised which increase the tolerance of the CDI technology to radiation. Of advantage are the fully diffused collector region and the heavily diffused base surface layer. The identified attributes include inherent latchup resistance, a high degree of tolerance to cumulative ionisation dose and to neutron displacement damage, and a reasonable transient upset behaviour.
  • Keywords
    Fabrication; Integrated circuit technology; Ionization; Isolation technology; Logic arrays; Photoconductivity; Semiconductor materials; Substrates; Surface resistance; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1979.4329751
  • Filename
    4329751