• DocumentCode
    842571
  • Title

    Carbon-doped MgB2 thin films grown by hybrid physical-chemical vapor deposition

  • Author

    Pogrebnyakov, A.V. ; Redwing, J.M. ; Giencke, J.E. ; Eom, C.B. ; Vaithyanathan, V. ; Schlom, D.G. ; Soukiassian, A. ; Mi, S.B. ; Jia, C.L. ; Chen, J. ; Hu, Y.F. ; Cui, Y. ; Li, Qi ; Xi, X.X.

  • Author_Institution
    Dept. of Phys., Pennsylvania State Univ., University Park, PA, USA
  • Volume
    15
  • Issue
    2
  • fYear
    2005
  • fDate
    6/1/2005 12:00:00 AM
  • Firstpage
    3321
  • Lastpage
    3324
  • Abstract
    Carbon-doped MgB2 thin films have been produced with hybrid physical-chemical vapor deposition (HPCVD) by adding a carbon-containing metalorganic magnesium precursor, bis(methylcyclopentadienyl)magnesium, to the carrier gas. The amount of the carbon added, thus the carbon content in the films, was controlled by the flow rate of a secondary hydrogen gas flow through the precursor bubbler. X-ray diffraction and electron microscopy showed that the carbon-doped MgB2 films are textured with c-axis oriented columnar nano-grains and highly resistive amorphous areas at the grain boundaries. When the amount of carbon in the films increases, the resistivity increases dramatically while Tc decreases much more slowly as the current-carrying cross section is reduced by the grain boundaries. The temperature-dependent part of the resistivity, Δρ≡ρ(300 K)-ρ(50 K), increases only modestly until the highly resistive grain boundaries completely cut off the conducting path. The impact of the reduced cross section on critical current density Jc is discussed.
  • Keywords
    X-ray diffraction; carbon; chemical vapour deposition; critical current density (superconductivity); electron microscopy; grain boundaries; high-temperature superconductors; magnesium compounds; superconducting thin films; type II superconductors; MgB2 thin films; MgB2:C; bis(methylcyclopentadienyl) magnesium; c-axis oriented columnar nanograins; carbon doping; carbon-containing metalorganic magnesium precursor; carrier gas; conducting path; critical current density; current-carrying cross section; electron microscopy; flow rate; highly resistive grain boundary; hybrid physical-chemical vapor deposition; magnesium diboride; precursor bubbler; secondary hydrogen gas flow; x-ray diffraction; Amorphous semiconductors; Chemical vapor deposition; Conductivity; Electron microscopy; Fluid flow; Grain boundaries; Hydrogen; Magnesium; Sputtering; X-ray diffraction; Carbon doping; hybrid physical-chemical vapor deposition; magnesium diboride; thin films;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/TASC.2005.848871
  • Filename
    1440382