Progress at IMGC in the absolute determination of the silicon d (220) lattice spacing

Author

Basile, Giuseppe ; Bergamin, Angelo ; Cavagnero, Giovanni ; Mana, Giovanni ; Zosi, Gianfranco

Author_Institution

Istituto di Metrol., Torino, Italy

Volume

38

Issue

2

fYear

1989

fDate

4/1/1989 12:00:00 AM

Firstpage

210

Lastpage

216

Abstract

The use of the combined X-ray and optical interferometers to measure the (220) lattice spacing of silicon is summarized. The experimental apparatus and its main features are described. The ratio of the X-ray to the optical periods was measured and an analysis of the inherent systematic errors initiated. The experimental proofs of Abbe´s and cosine errors showed them to be the most important. A technique for correcting Abbe´s errors processing the X-ray fringes belonging to both diffracted and transmitted beams is described and a preliminary d ₂₂₀ value is reported

Keywords

X-ray applications; constants; interferometry; lattice constants; light interferometry; measurement errors; silicon; Abbe´s errors; IMGC; Si; X-ray fringes; X-ray interferometers; cosine errors; d(220) lattice spacing; d₂₂₀ value; diffracted beams; optical interferometers; systematic errors; transmitted beams; Crystals; Error correction; Interferometers; Laser stability; Lattices; Optical attenuators; Optical coupling; Optical interferometry; Optical sensors; Silicon;

fLanguage

English

Journal_Title

Instrumentation and Measurement, IEEE Transactions on

Publisher

ieee

ISSN

0018-9456

Type

jour

DOI

10.1109/19.192274

Filename

192274