Magnetic anisotropy in thin-Ni[001] films: comparison between static and dynamic techniques

Author

Gubbiotti, Gianluca ; Carlotti, Giovanni ; Ciria, Miguel ; Handley, R. C O

Author_Institution

Nat. Inst. of Phys. of Matter, Perugia, Italy

Volume

38

Issue

5

fYear

2002

fDate

9/1/2002 12:00:00 AM

Firstpage

2649

Lastpage

2651

Abstract

The magnetic anisotropy of epitaxial Cu-Ni-Cu-Si[001] films, with Ni thickness between 17 and 150 Å, has been studied by Brillouin light scattering from spin waves. Both the Neel interface anisotropy term and the second-order magnetoelastic coefficient have been assumed as adjustable parameters in the best fit procedure of the effective anisotropy constant as a function of the Ni thickness. These results are in very good agreement with those previously obtained by torque magnetometry.

Keywords

Brillouin spectra; magnetic anisotropy; magnetic epitaxial layers; magnetoelastic effects; nickel; spin waves; Brillouin light scattering; Cu-Ni-Cu-Si; Cu-Ni-Cu-Si[001] epitaxial film; Neel interface anisotropy; Ni[001] thin film; dynamic technique; magnetic anisotropy; magnetoelastic coefficient; spin wave; static technique; Anisotropic magnetoresistance; Brillouin scattering; Light scattering; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Magnetic separation; Magnetization; Magnetostatic waves; Physics;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2002.801980

Filename

1042302