• DocumentCode
    859333
  • Title

    Microfabrication of Magnetic Tunnel Junctions Using CH _{3} OH Etching

  • Author

    Otani, Y. ; Kubota, H. ; Fukushima, A. ; Maehara, H. ; Osada, T. ; Yuasa, S. ; Ando, K.

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. & Technol.
  • Volume
    43
  • Issue
    6
  • fYear
    2007
  • fDate
    6/1/2007 12:00:00 AM
  • Firstpage
    2776
  • Lastpage
    2778
  • Abstract
    The 100-nm-scale CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) were fabricated using a CH3OH etching process. These MTJs have steep side walls and show clear MR loops. The distributions of magnetic properties of CH3OH etched MTJs were smaller than those of conventional Ar ion etched MTJs
  • Keywords
    boron alloys; cobalt alloys; etching; ferromagnetic materials; iron alloys; magnesium compounds; magnetic multilayers; magnetic storage; magnetic thin film devices; magnetic thin films; magnetic tunnelling; magnetoresistance; random-access storage; CoFeB-MgO-CoFeB; etching process; magnetic properties; magnetic tunnel junctions; magnetoresistance loops; microfabrication; Amorphous magnetic materials; Argon; Etching; Magnetic devices; Magnetic films; Magnetic materials; Magnetic properties; Magnetic tunneling; Magnetoelectronics; Shape control; Etching; magnetic devices; magnetic films; magnetic memories; tunneling;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2007.894016
  • Filename
    4202760
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=859333