DocumentCode
861068
Title
Trapped charge modulation: a new cause of instability in AlGaAs/InGaAs pseudomorphic HEMT´s
Author
Meneghesso, Gaudenzio ; Canali, Claudio ; Cova, Paolo ; De Bortoli, Eros ; Zanoni, Enrico
Author_Institution
Dipartimento di Elettronica e Inf., Padova Univ., Italy
Volume
17
Issue
5
fYear
1996
fDate
5/1/1996 12:00:00 AM
Firstpage
232
Lastpage
234
Abstract
A new degradation mechanism of PM-HEMT´s subsequent to hot electron stress tests or high temperature storage tests is presented. A noticeable increase in drain-to-source current, I/sub DS/, is observed after the tests. We show that this I/sub DS/ variation is slowly recoverable and is correlated with the presence of deep levels in the device. Stress tests cause a variation of trapped charge. Trapping of holes created by impact-ionization and/or thermally stimulated electron detrapping induce a variation of the net negative trapped charge, leading to a decrease in the threshold voltage, V/sub T/ and a consequent increase in I/sub DS/. The correlation between g/sub m//spl Delta/V/sub T/ and /spl Delta/I/sub DS/ clearly demonstrates that the variation of trapped charge induced by hot electron tests is localized under the gate.
Keywords
III-V semiconductors; aluminium compounds; deep levels; electron traps; gallium arsenide; high electron mobility transistors; hole traps; hot carriers; impact ionisation; indium compounds; semiconductor device reliability; stability; AlGaAs-InGaAs; PHEMT; deep levels; degradation mechanism; drain-to-source current; high temperature storage tests; hot electron stress tests; impact ionization; instability; pseudomorphic HEMT; thermally stimulated electron detrapping; threshold voltage; trapped charge modulation; Acquired immune deficiency syndrome; Aging; Electron traps; HEMTs; Indium gallium arsenide; Intrusion detection; Irrigation; Stress; Temperature; Testing;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.491839
Filename
491839
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