DocumentCode
864122
Title
Magnetic and structural properties of Co ion-implanted GaN
Author
Kim, Woochul ; Kang, Hee Jae ; Oh, Suhk Kun ; Shin, Sangwon ; Lee, Jong-Han ; Song, Jonghan ; Noh, Sam Kyu ; Oh, Sang Jun ; Kim, Chul Sung
Author_Institution
Dept. of Phys., Chungbuk Nat. Univ., Cheongju, South Korea
Volume
5
Issue
2
fYear
2006
fDate
3/1/2006 12:00:00 AM
Firstpage
149
Lastpage
151
Abstract
A GaN epilayer was grown on Al2O3 substrate by metal-organic chemical vapor deposition, and Co- ions with a dose of 3×1016 cm-2 were implanted into GaN at 350°C. The implanted samples were postannealed at 700°C-900°C to recrystallize the samples and to remove implantation damage. We have investigated the magnetic and structural properties of Co ion-implanted GaN by using X-ray diffraction (XRD), superconducting quantum interference device (SQUID) magnetometer, and X-ray photoelectron spectroscopy (XPS). XRD results did not show any peaks associated with the second phase formation, and only the diffraction from the GaN layer and substrate structure were observed. The temperature dependence of magnetization taken in zero-field-cooling and field-cooling conditions showed the features of superparamagnetic system in films annealed at 700°C-900°C. The magnetization curves at 5 K for samples annealed at 700°C-900°C exhibits ferromagnetic hysteresis loops, and the highest residual magnetization (MR) and coercivity (Hc) of MR=1.5×10-4 emu/g and Hc=107 Oe were found in the 800°C annealed sample. XPS measurement showed the metallic Co 2p core levels and the metallic valence band spectra for as-implanted and 700°C-900°C annealed samples. From these, it could be explained that the magnetic property of our films originated from Co and CoGa magnetic clusters.
Keywords
III-V semiconductors; MOCVD coatings; X-ray diffraction; X-ray photoelectron spectra; cobalt; coercive force; ferromagnetic materials; gallium compounds; ion implantation; magnetic annealing; magnetic epitaxial layers; magnetic hysteresis; magnetic semiconductors; recrystallisation; semiconductor epitaxial layers; superparamagnetism; valence bands; wide band gap semiconductors; 350 C; 700 to 900 C; Al2O3; GaN:Co; SQUID; X-ray diffraction; X-ray photoelectron spectroscopy; XPS; XRD; coercivity; ferromagnetic hysteresis loops; ion-implanted semiconductor epilayer; magnetic clusters; magnetic properties; magnetization curves; metal-organic chemical vapor deposition; metallic core levels; metallic valence band spectra; phase formation; postannealing; recrystallization; residual magnetization; structural properties; substrate structure; superconducting quantum interference device magnetometer; superparamagnetic system; zero-field-cooling; Annealing; Chemical vapor deposition; Gallium nitride; Magnetic devices; Magnetic properties; Magnetization; SQUIDs; Superconducting magnets; X-ray diffraction; X-ray scattering; Ion implantation; magnetic semiconductor;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2006.869652
Filename
1605228
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