Magnetization process and coercivity of sputtered Co/Pt multilayered films

Author

Honda, Shigeo ; Tanimoto, Hiroyuki ; Kusuda, Tetsuzo

Author_Institution

Dept. of Phys. Electron., Hiroshima Univ., Japan

Volume

26

Issue

5

fYear

1990

fDate

9/1/1990 12:00:00 AM

Firstpage

2730

Lastpage

2732

Abstract

The film structures and magnetic properties of Co/Pt multilayers prepared by magnetron sputtering are examined. The multilayer consists of columns of 50~100 Å diameter grown vertically to the film plane, and the coercive field becomes smaller with decreasing thickness ratio of Co to Pt layers and with decreasing also total film thickness. The coercivity, however, can be enlarged up to about 3 kOe by a Pt underlayer even in ultrathin Co/Pt films. The magnetization process and the behaviour of the magnetic domains are explained by the mixing mode of the wall motion and the moment rotation

Keywords

cobalt; coercive force; magnetic domain walls; magnetic domains; magnetic moments; magnetic thin films; magnetisation; platinum; sputtered coatings; coercive field; coercivity; domain wall motion; film structures; film thickness; magnetic domains; magnetization process; magnetron sputtering; mixing mode; moment rotation; sputtered Co-Pt multilayered films; Anisotropic magnetoresistance; Coercive force; Glass; Magnetic films; Morphology; Remanence; Saturation magnetization; Shape; Substrates; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.104853

Filename

104853