• DocumentCode
    871287
  • Title

    Gamma Total Dose Effects on ALS Bipolar Oxide Sidewall Isolated Devices

  • Author

    Buschbom, Milton L. ; Jeffrey, Edward N. ; Rhine, Loran E. ; Spratt, David B.

  • Author_Institution
    Texas Instruments Incorporated
  • Volume
    30
  • Issue
    6
  • fYear
    1983
  • Firstpage
    4105
  • Lastpage
    4109
  • Abstract
    Advances in bi-polar technology that increase device performance through the use of oxide sidewall isolation have revived concerns about total dose radiation effects. Extensive Cobalt 60 tests of Texas Instruments ALS devices were conducted and comparative results of "walled" and "nested" emitter devices are included. It was determined that inversion at the Si-SiO2 interface between the isolation oxide and residual EPI material was the source of IIH leakage. Controls were established to improve gamma total dose tolerance.
  • Keywords
    Circuits; Dielectric substrates; Electrostatic discharge; Etching; Oxidation; Protection; Resists; Schottky diodes; Silicon; Testing;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1983.4333090
  • Filename
    4333090