DocumentCode
871287
Title
Gamma Total Dose Effects on ALS Bipolar Oxide Sidewall Isolated Devices
Author
Buschbom, Milton L. ; Jeffrey, Edward N. ; Rhine, Loran E. ; Spratt, David B.
Author_Institution
Texas Instruments Incorporated
Volume
30
Issue
6
fYear
1983
Firstpage
4105
Lastpage
4109
Abstract
Advances in bi-polar technology that increase device performance through the use of oxide sidewall isolation have revived concerns about total dose radiation effects. Extensive Cobalt 60 tests of Texas Instruments ALS devices were conducted and comparative results of "walled" and "nested" emitter devices are included. It was determined that inversion at the Si-SiO2 interface between the isolation oxide and residual EPI material was the source of IIH leakage. Controls were established to improve gamma total dose tolerance.
Keywords
Circuits; Dielectric substrates; Electrostatic discharge; Etching; Oxidation; Protection; Resists; Schottky diodes; Silicon; Testing;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1983.4333090
Filename
4333090
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