Production of very high electron density assisted by lasers

Author

Girardeau-Montaut, J.P. ; Girardeau-Montaut, C. ; Dei-Cas, R.

Author_Institution

Lab. des Interactions Laser-Mater., Univ. Claude Bernard, Lyon, France

Volume

24

Issue

6

fYear

1989

fDate

12/1/1989 12:00:00 AM

Firstpage

1049

Lastpage

1052

Abstract

An analysis is presented of a new basic concept for very-high-electron-density emission from metal photocathodes conjugating the action of two lasers. The action of the first laser, a low-frequency (infrared or far-infrared), high-density source (>10 to 100 MW/cm²), is supported to lower the potential barrier and enhance the energy of conduction electrons at the surface of the material and increase significantly the effective photoelectric quantum yield. The second laser is a visible or ultraviolet laser with a lower intensity (<100 kW/cm²), extracting a high electron density by direct photoelectric effect

Keywords

laser beam applications; laser beam effects; photocathodes; photoemission; photoemissive devices; FIR laser; IR laser; UV laser; conduction electron energy; direct photoelectric effect; effective photoelectric quantum yield; far-infrared; high electron density; high-density source; infrared; laser action; low intensity; low-frequency; material surface; metal photocathodes; potential barrier; ultraviolet laser; very-high-electron-density emission; visible laser; Cathodes; Electron beams; Electron emission; Frequency; Guns; Laser beams; Optical pulses; Production; Surface emitting lasers; Vacuum systems;

fLanguage

English

Journal_Title

Electrical Insulation, IEEE Transactions on

Publisher

ieee

ISSN

0018-9367

Type

jour

DOI

10.1109/14.46337

Filename

46337