DocumentCode
897392
Title
Magnetic and microwave resonance characterization of ion beam sputtered amorphous FexNi80-xB15Si5 films
Author
Oliver, S.A. ; Harris, V. ; Ryu, J. ; Vittoria, C.
Author_Institution
Center for Electromagn. Res., Northeastern Univ., Boston, MA, USA
Volume
25
Issue
5
fYear
1989
fDate
9/1/1989 12:00:00 AM
Firstpage
3355
Lastpage
3357
Abstract
A series of amorphous FexNi80-xB15Si5 thin films have been deposited by ion beam sputtering. Beam parameters used during deposition were chosen to be those which produced the highest quality Fe 40Ni40B15Si5 film, as determined by the film magnetic properties. The films were characterized by reflection-electron-diffraction, resistivity, vibrating-sample-magnetometer, ferromagnetic-resonance (FMR), and frequency-swept zero-field-resonance measurements. The samples are found to be magnetically active, with no biasing external field, under 1 GHz. The small FMR linewidths, high resistivity, and large saturation magnetization show that these alloys may be applicable in thin-film microwave devices
Keywords
boron alloys; electron diffraction examination of materials; ferromagnetic properties of substances; ferromagnetic resonance; iron alloys; magnetic properties of amorphous substances; magnetic thin films; magnetisation; nickel alloys; silicon alloys; sputtered coatings; FMR linewidths; FexNi80-xB15Si5 amorphous films; ferromagnetic-resonance; frequency-swept zero-field-resonance; ion beam sputtering; microwave resonance characterization; reflection-electron-diffraction; resistivity; saturation magnetization; thin-film microwave devices; vibrating-sample-magnetometer; Amorphous magnetic materials; Conductivity; Ion beams; Iron; Magnetic films; Magnetic resonance; Optical films; Saturation magnetization; Semiconductor films; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.42299
Filename
42299
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