DocumentCode
911915
Title
Statistical Simulation of the IC Manufacturing Process
Author
Maly, Wojciech ; Strojwas, Andrzej J.
Author_Institution
Department of Electrical Engineering, Carnegie-Mellon University, Pittsburgh, PA, USA
Volume
1
Issue
3
fYear
1982
fDate
7/1/1982 12:00:00 AM
Firstpage
120
Lastpage
131
Abstract
Information about the random behavior of the IC manufacturing process can be applied for IC and process design tasks. In this paper a methodology for modeling random fluctuations of IC manufacturing process is proposed. A simulator of a complete bipolar manufacturing process called FABRICS, is described. A few applications illustrating advantages of the proposed statistical process modeling method are discussed.
Keywords
Circuit simulation; Computational modeling; Fabrics; Fluctuations; Impurities; Integrated circuit modeling; Manufacturing processes; Monolithic integrated circuits; Process design; Random variables;
fLanguage
English
Journal_Title
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher
ieee
ISSN
0278-0070
Type
jour
DOI
10.1109/TCAD.1982.1270003
Filename
1270003
Link To Document