DocumentCode
912605
Title
Well-posedness of continuum models for weakly ionized plasmas
Author
Wilcoxson, Mark H. ; Manousiouthakis, Vasilios I.
Author_Institution
Dept. of Chem. Eng., California Univ., Los Angeles, CA, USA
Volume
21
Issue
2
fYear
1993
fDate
4/1/1993 12:00:00 AM
Firstpage
213
Lastpage
222
Abstract
Continuum fluid models of weakly ionized plasmas are useful in the design and control of plasma-assisted deposition and etching processes. The equations in these models are numerically stiff. Their stiffness is affected by the imposed boundary conditions. In this work, a DC discharge model is studied and the effect of the boundary conditions on the model solution is investigated. It is established, both analytically and numerically, that depending on the choice of boundary conditions the model may range from being ill-posed to being solvable with standard software. It is also established that excessive truncation error maybe present in numerical simulations which appear to qualitatively capture plasma structure. Accurate numerical simulations of the considered model, with alternate boundary conditions, are shown to capture many characteristics of a DC discharge, albeit at lower values of applied voltage than those reported in the literature. Finally, model shortcomings are discussed
Keywords
discharges (electric); plasma deposition; plasma simulation; sputter etching; DC discharge model; boundary conditions; continuum fluid models; continuum models; etching; model solution; numerical simulations; numerically stiff equations; plasma-assisted deposition; truncation error; weakly ionized plasmas; Boundary conditions; Equations; Etching; Finite wordlength effects; Numerical models; Numerical simulation; Plasma applications; Plasma properties; Plasma simulation; Software standards;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.219382
Filename
219382
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