DocumentCode
930666
Title
Fabrication tolerance analysis of an OEIC passive duplexer
Author
Chipouras, A. ; Papastergiou, G. ; Sphicopoulos, T.
Author_Institution
Dept. of Inf., Athens Univ., Greece
Volume
5
Issue
7
fYear
1993
fDate
7/1/1993 12:00:00 AM
Firstpage
800
Lastpage
803
Abstract
A simulation method has been developed to study the fabrication tolerances of a passive duplexer on InP substrate which could be a part of an optoelectronic integrated circuit (OEIC) module. This method, based on a Taylor´s series expansion, is fast enough to estimate the effect produced on the crossover power when a simultaneous variation of the duplexer parameters take place. It seems to be very useful, particularly during a repetitive control of the device characteristics.<>
Keywords
approximation theory; integrated optoelectronics; optical waveguide theory; InP; OEIC passive duplexer; Taylor´s series expansion; crossover power; device characteristics; fabrication tolerances; optical workshop techniques; optoelectronic integrated circuit; repetitive control; simulation method; substrate; Etching; Indium phosphide; Informatics; Lithography; Optical device fabrication; Optical propagation; Optical waveguides; Optoelectronic devices; Polynomials; Tolerance analysis;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.229811
Filename
229811
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