Preparation and properties of Nb/Al-AlO/sub x//Nb multilayers

Author

Kohlstedt, H. ; Hallmanns, G. ; Nevirkovets, I.P. ; Guggi, D. ; Heiden, C.

Author_Institution

Inst. fur Schicht- und Ionentechnik, Julich, Germany

Volume

3

Issue

1

fYear

1993

fDate

3/1/1993 12:00:00 AM

Firstpage

2197

Lastpage

2200

Abstract

The authors have deposited Nb/Al-AlO/sub x//Nb multilayers on Si substrates by DC and RF magnetron sputtering. To assist the fabrication of stacked tunnel junctions they investigated the layers by transmission electron microscopy and anodization spectroscopy. The accumulated internal mechanical stress in the niobium films depends on the argon sputtering pressure and was analyzed by the X-ray stress evaluation method. Up to ten junctions in one stack were prepared. Performance of the junctions is discussed on basis of I-V characteristics and Fraunhofer patterns.<>

Keywords

aluminium; aluminium compounds; anodisation; internal stresses; niobium; sputter deposition; sputtered coatings; superconducting junction devices; superconducting thin films; transmission electron microscope examination of materials; type II superconductors; Fraunhofer patterns; I-V characteristics; Nb-Al-AlO/sub x/-Nb multilayers; accumulated internal mechanical stress; anodization spectroscopy; fabrication; magnetron sputtering; stacked tunnel junctions; superconducting junctions; transmission electron microscopy; Argon; Fabrication; Magnetic analysis; Magnetic multilayers; Niobium; Radio frequency; Spectroscopy; Sputtering; Stress; Transmission electron microscopy;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.233939

Filename

233939