• DocumentCode
    947702
  • Title

    High-density optical storage using arsenic nanoclusters in GaAs and AlGaAs

  • Author

    Melloch, M.R. ; Nolte, David D. ; Woodall, Jerry M.

  • Author_Institution
    Purdue Univ., West Lafayette, IN
  • Volume
    39
  • Issue
    11
  • fYear
    1992
  • fDate
    11/1/1992 12:00:00 AM
  • Firstpage
    2654
  • Lastpage
    2655
  • Abstract
    Summary form only given. A novel GaAs-based photorefractive thin-film material with ultrashort transport lengths has been developed. This material consists of As nanoclusters in a high-quality GaAs matrix, denoted GaAs:As. The As clusters act as quantum antidots which exclude the wavefunctions of the electrons and holes. The resulting reduced space of the carrier wavefunctions results in quantum-confined excitons in the GaAs regions between the As clusters. Therefore, GaAs:As exhibits a large electrooptic effect at room temperature for photon energies close to the bandgap. This large electrooptic effect, along with charge trapping on the As clusters, provides a high-density holographic storage medium. The ultrafast lifetimes of the photogenerated carriers due to the As clusters produce excellent spatial resolution during writing of holographic space-charge gratings. Fringe spacings as small as 600 nm were supported in GaAs:As, yielding a volume optical data density greater than 1012 b/cm3
  • Keywords
    III-V semiconductors; electro-optical devices; gallium arsenide; holographic gratings; holographic storage; photorefractive materials; semiconductor quantum dots; 600 nm; AlGaAs; As nanoclusters; GaAs matrix; charge trapping; electrooptic effect; fringe spacings; high-density holographic storage medium; holographic space-charge gratings; photorefractive thin-film material; quantum antidots; quantum-confined excitons; spatial resolution; ultrafast photogenerated carrier lifetime; ultrashort transport lengths; volume optical data density; Electrooptic effects; Gallium arsenide; Holographic optical components; Holography; Optical materials; Photonic band gap; Photorefractive effect; Photorefractive materials; Transistors; Ultrafast optics;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.163514
  • Filename
    163514