DocumentCode
948704
Title
The response of a microwave multipolar bucket plasma to a high-voltage pulse with finite rise time
Author
Qin, Shu ; Chan, Chung
Author_Institution
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
Volume
20
Issue
5
fYear
1992
fDate
10/1/1992 12:00:00 AM
Firstpage
569
Lastpage
571
Abstract
A collisional model that describes the response of a microwave multipolar bucket plasma to a high-voltage pulse with finite risetime has been developed for plasma immersion ion implantation (PIII). The agreement between this model and the measurements of the sheath position and target current in a 100 mtorr helium plasma is found to be much improved when the risetime of the pulse and the ion energy distribution during the PIII process is considered
Keywords
ion implantation; plasma applications; 100 mtorr; collisional model; finite rise time; high-voltage pulse; ion energy distribution; microwave multipolar bucket plasma; plasma immersion ion implantation; Current measurement; Electrons; Energy measurement; Helium; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Plasma waves; Position measurement; Pulse measurements; Semiconductor device doping;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.163596
Filename
163596
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