V.P.E. GaAs m.e.s.f.e.t. structure using oxygen injection during buffer layer growth

GaAs m.e.s.f.e.t. structures with high-resistivity buffer layers were prepared by introducing oxygen into the deposition system during growth. The electrical properties of the buffer layers are independent of the oxygen content of the gas phase over a large range of partial pressures. The characteristics of devices prepared with such layers are excellent.