• DocumentCode
    951563
  • Title

    Preparation and thermomagnetic properties of Ti-doped MnBi thin films

  • Author

    Yoshii, S. ; Egashira, K.

  • Author_Institution
    Nippon Telegraph and telephone public corporation, Tokai, Ibaraki-ken, Japan
  • Volume
    10
  • Issue
    3
  • fYear
    1974
  • fDate
    9/1/1974 12:00:00 AM
  • Firstpage
    587
  • Lastpage
    590
  • Abstract
    Ti-substituted MnBi thin films have been prepared on glass substrates by a vacuum deposition technique, and studies of magnetic, magnetooptic, and thermomagnetic properties of the films have been made. The nominal composition range of Mn1-xTixBi was x=0.1 to 0.4. The films were well oriented with the c-axis perpendicular to the film plane. The Curie point of the quenched high temperature phase (qhtp) decreased with increasing Ti-concentration, but that of the low temperature phase (ltp) was not altered by Ti-doping. The best Kerr rotation obtained for the qhtp films with x=0.4 was 0.5 deg at 6328 Å. Both the Faraday and the Kerr rotation of the ltp and qhtp films decreased with increasing the Ti concentration. The time constant associated with the qhtp to ltp transformation was 103sec at 180°C for x=0.4. Curie point writing experiments with a helium-neon gas laser showed that the writing threshold of the qhtp film was about one third of that of the ltp film.
  • Keywords
    Magnetic thermal effects; Manganese bismuth films; Bismuth; Glass; Magnetic films; Magnetic properties; Sputtering; Substrates; Temperature; Transistors; Vacuum technology; Writing;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1974.1058355
  • Filename
    1058355