DocumentCode
956831
Title
New Method in Fabrication of Tantalum Thin-Film Integrated Circuits
Author
Miwa, Ichiro ; Nishimura, Takeo
Author_Institution
Hitachi Ltd.
Volume
1
Issue
1
fYear
1965
fDate
6/1/1965 12:00:00 AM
Firstpage
285
Lastpage
289
Abstract
A simple and accurate method in fabrication of tantalum thin-film integrated circuits was developed. In that, after the sheet resistivity of deposited film is adjusted by anodizing its surface, photolithographic processes are carried out successively.
Keywords
Etching; Fabrication; IC (Integrated circuits); Integrated circuits; Photolithography; Tantalum; Tantalum oxide; Thin films; Capacitors; Conductive films; Conductivity; Dielectric thin films; Etching; Fabrication; Resistors; Substrates; Surface resistance; Thin film circuits;
fLanguage
English
Journal_Title
Parts, Materials and Packaging, IEEE Transactions on
Publisher
ieee
ISSN
0018-9502
Type
jour
DOI
10.1109/TPMP.1965.1135377
Filename
1135377
Link To Document