DocumentCode
960523
Title
1D to 1D tunneling in a dual electron waveguide device
Author
del Alamo, Jesus A. ; Melloch, M.R. ; Rooks, Michael J.
Volume
40
Issue
11
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
2135
Lastpage
2136
Abstract
Summary form only given. The authors report the first unambiguous observation of controlled electron tunneling between two closely spaced 1D electron waveguides. This represents a significant step toward the realization of a quantum field-effect electron directional coupler (QFED). The authors have fabricated a variety of dual electron waveguide devices with different lengths and widths on an AlGaAs/GaAs heterostructure (N s=4×011 cm-2 and μ=1.2×106 cm2/V-s at 4 K). The key feature in these devices is the 30-nm-wide middle gate fabricated using a single-pass e-beam lithography technique. Such a thin gate is required to achieve significant tunneling. A 1D to 1D regime is established when two electron waveguides are implemented. The tunneling current should be sensitive to the alignment of the subbands in the two electron waveguides. In this regime, bumps in the tunneling current are observed as a function of both side-gate voltages as the individual subbands line up between the two waveguides. This is unmistakable proof that 1D to 1D tunneling is taking place
Keywords
III-V semiconductors; aluminium compounds; directional couplers; electron beam lithography; field effect devices; gallium arsenide; tunnelling; 1D to 1D tunneling; AlGaAs-GaAs; dual electron waveguide device; quantum field-effect electron directional coupler; side-gate voltages; single-pass e-beam lithography technique; subbands; Circuits; Electrons; FETs; Frequency; Gallium arsenide; Lithography; Resonance; Split gate flash memory cells; Tunneling; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.239824
Filename
239824
Link To Document