DocumentCode
960597
Title
Band structure engineering for electron tunneling in heterostructures
Author
Beresford, R. ; Luo, Lei ; Wang, W.I.
Author_Institution
Dept. of Electr. Eng. & Microelectron. Sci., Columbia Univ., New York, NY, USA
Volume
36
Issue
11
fYear
1989
fDate
11/1/1989 12:00:00 AM
Firstpage
2618
Abstract
Summary form only given. It has been shows that inelastic tunneling via the AlGaAs X minimum is responsible for the excess valley current in GaAs/AlGaAs resonant tunneling devices. In addition, negative differential resistance has been observed in GaAs/AlAs/GaAs single-barrier heterostructures, due to the presence of a quasi-bound state associated with the X-point profile. This surprising result is due to the fact that, although the Gamma -point profile of this heterostructure is a simple single tunneling barrier, the X-point profile actually constitutes a quantum well some 0.3 eV deep lying about 0.2 eV above the Gamma -point of GaAs. Another way to realize single-barrier devices with negative differential resistance is based on tunneling below the midgap. In this case, the barrier transmission probability decreases with applied bias because the decay constant increases toward the middle of the bandgap. Room-temperature observations of this type of negative differential resistance were made. Peak-to-valley ratios of 1.6:1 are seen in InAs/AlGaSb single-barrier devices exhibiting this phenomenon.
Keywords
band structure of crystalline semiconductors and insulators; interface electron states; negative resistance; semiconductor junctions; semiconductor quantum wells; tunnelling; GaAs-AlAs-GaAs; GaAs-AlGaAs; Gamma -point profile; III-V semiconductors; InAs-AlGaSb; X-point profile; band structure engineering; barrier transmission probability; decay constant; electron tunneling; excess valley current; inelastic tunneling; negative differential resistance; peak-to-valley ratio; quantum well; quasi-bound state; resonant tunneling devices; single-barrier devices; single-barrier heterostructures; Electron mobility; Electrons; Epitaxial layers; Gallium arsenide; HEMTs; Interference; MODFETs; Photonic band gap; Rail transportation; Resonant tunneling devices; Superlattices; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.43735
Filename
43735
Link To Document